Since the beam is optimally focused at the top of the sample. Make sure that the resist vacuum interface faces the incoming beam. Mount the resist coated TEM chip on the STEM sample holder. Otherwise, repeat the resist coating process on a fresh TEM window. If the film is homogenous across the central region of the membrane as shown here, proceed to the next step. Inspect the resist uniformity over the TEM window using an optical microscope. Depending on the resist used follow the spin coating and baking parameters shown in the text protocol.įollowing spin coating, carefully remove the TEM chip from the silicon holder. Using a pipet, cover the entire TEM window with one drop of HSQ. To spin coat the HSQ resist, mount the silicon holder on the spinner chuck and align the center of the TEM window approximately with the center of the spinner rotor. Mount the TEM chip on the silicon holder making sure that it is attached to the carbon tape strips only at two opposite edges. Rinse the strips with isopropyl alcohol to reduce their adhesive strength and avoid breaking the delicate TEM chip during removal from the silicon holder. To begin place two strips of double-sided carbon tape approximately equidistant from the center of the silicon holder and separated slightly less than the diameter of the TEM chip. Demonstrating will be Na Li, a student working at The Center for Functional Nanomaterials. Thus, enable fabrication of novel devices at single-digit nanometer resolution. The techniques that are described in this protocol can be used to transfer nanoscale pattern into a variety of materials. While very specialized and expensive tools, these instruments are sometimes available for use without cost. Use of an aberration-corrected STEM in this protocol allows routine patterning of lithographic features with single nanometer resolution. This protocol provides guidance for defining patterns with single-digit nanometer resolution in two common electron-beam resist using a scanning transmission electron microscope or STEM as the exposure tool.
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